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Product ID: 03
USHIO/ Wafer Edge Exposure System
It helps to remove photoresist from the wafer periphery. It is also useful for bumping process.
CONTACT
Sales Contact: Frank Chiu
Extn.: 212
E-mail: frank@limchemical.com.tw
Service Contact: Boson Liu
Extn.: 801
E-mail: liu@limchemical.com.tw
China
Sales Contact: Jack Lin
Mobile: +86-138-1880-6522
E-mail: jackslin@limtec.com.cn
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