Product ID: 09

HOLON/ CD-SEM for Wafer & Mask


Holon have developed the optimum solution for charge-up suppression and achieved charge-less CD measurement for all types of masksĄ]WIND-SEM). The system is designed to observe and measure not only EUV mask but Nanoimprint template.


CONTACT

Sales Contact: Vince Hsu

Extn.: 320

E-mail: vincehsu@limchemical.com.tw

Service Contact: Chien Kang Chen

Extn.: 804

E-mail: ckdan@limchemical.com.tw

China

Sales Contact: Jack Lin

Mobile: +86-138-1880-6522

E-mail: jackslin@limtec.com.cn
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Ordering information:

  • Minimum Order: -
  • TEL: 886-3-5690077
  • FAX: 886-3-5693388



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