HOLON/ CD-SEM for Wafer & Mask
Product ID: 09
Holon have developed the optimum solution for charge-up suppression and achieved charge-less CD measurement for all types of masks（WIND-SEM). The system is designed to observe and measure not only EUV mask but Nanoimprint template.
Contact Window
-Taiwan-
Sales: Vince Hsu
TEL: +886-3-5690077 #326
E-mail: vincehsu@limchemical.com.tw
Order Information:
- Minimum Order: -
Contact Detail
| Contact: | Frank Chiu |
| TEL: | 886-3-5690077 |
| FAX: | 886-3-5693388 |
| Email: | frank@limchemical.com.tw |
| URL: | http://www.limchemical.com.tw |
| ZIP: | 303 |
