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ACCEPT AND PROCEED
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HOLON/ CD-SEM for Wafer & Mask

Product ID: 09

Holon have developed the optimum solution for charge-up suppression and achieved charge-less CD measurement for all types of masks(WIND-SEM). The system is designed to observe and measure not only EUV mask but Nanoimprint template.




Contact Window

-Taiwan-

Sales: Vince Hsu

TEL: +886-3-5690077 #326

E-mail: vincehsu@limchemical.com.tw

Order Information:
  • Minimum Order: -
Contact Detail
Contact:Frank Chiu
TEL:886-3-5690077
FAX:886-3-5693388
Email:frank@limchemical.com.tw
URL:http://www.limchemical.com.tw
ZIP:303