Holon have developed the optimum solution for charge-up suppression and achieved charge-less CD measurement for all types of masks(WIND-SEM). The system is designed to observe and measure not only EUV mask but Nanoimprint template.
Contact Window
Sales: Chen
TEL: +886-3-5690077 #804
E-mail: ckdan@limchemical.com.tw
Contact: | Frank Chiu |
TEL: | 886-3-5690077 |
FAX: | 886-3-5693388 |
Email: | frank@limchemical.com.tw |
URL: | http://www.limchemical.com.tw |
ZIP: | 303 |