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APPRECIA/ PSYRION(H3PO4 Reclaim System)

APPRECIA/ PSYRION(H3PO4 Reclaim System)

Product ID: 36

Reclaim system for H3PO4 used in SiN Etching Process,Capable to remove over 85% of SiO2.
PSYRION is not only ecological,but also economically effective.

Contact Detail
Contact:Frank Chiu
TEL:886-3-5690077
FAX:886-3-5693388
Email:frank@limchemical.com.tw
URL:http://www.limchemical.com.tw
ZIP:303