Key Features — Ultra high resolution optical system based on UV laser — Support simultaneous inspection of reflected and transmitted light — Support DD, SL, and DB inspection modes — Supports SMIF Pod, Nikon CASE, Canon CASE, Shipping Box and other film boxes — Supports GDS, OASIS, MEBES file formats — Supports Binary and PSM masks — Support OPC calibration — Support GPU distributed computing
VPTek STORM 3000U - IC Mask substrate defect inspection 設備
Key Features — Laser based ultra-high resolution optical system — Support SMIF Pod automatic loading and unloading — Support particle, scratch, pinhole, and dirt inspection — Support automatic review and defect classification — Support polishing plates, chrome plates, and post adhesive testing — Support automatic grading and caching of substrates — Support GPU distributed computing
VPTek IRIS 530 - IC Mask double surface particle inspection設備
Key Features — Simultaneously detect particles on the glass surface and pellicle surface — Compatible with RSP200 Nikon Case、Opening of Crystal Box and Automatic Upper and Lower Plate — Inspection method based on bright field and dark field — Pellicle surface, glass surface, inner and outer inspection areas of membrane frame can be flexibly set — Visual display of the relationship between defect location and graphic location — Configure an air bath knife to remove surface particles
Key Features Compatible with 4, 6, and 8-inch wafers simultaneously, flexible and convenient Dual Port cyclic loading and unloading reduces operator waiting time Supports bright and dark field illumination to better capture subtle defects Support multiple automatic focusing modes in hardware, software, and fitting to ensure the inspection accuracy of large warped wafers Support partition inspection with multiple ROIs and layers Support D2D、D2G and D2DB inspection algorithm Support AI defect inspection and classification Support data integration with customer MES systems
VPTek Tornado 2100 - Wafer CD / OVL measurement設備
Tornado 2100 是 VPTek 推出的晶圓全自動光學 CD 及 OVERLAP 測量設備,以高解析度的光學影像系統為基礎,進一步提升圖形對比度並減少了過渡像素。搭配高效能移動平台,提高了量測過程中定位的效率,減少了穩態抖動,並滿足了量測重複性的嚴格要求。
Application Scenarios 針對4、6、8吋晶圓前段製程中的 CD 及 OVERLAP 精度的測量
Key Features Compatible with 4, 6, and 8-inch wafers simultaneously, flexible and convenient Support automatic measurement based on Recipe Support multiple wavelength lighting and optical systems including white light, RGB, and UV Support multiple line width measurement methods such as grayscale threshold, grayscale change rate, and line fitting Multi hold non-linear compensation function Support line width measurement under low contrast conditions
Key Features Supports feeding methods such as 8-inch SMIF, 12 inch FOUP, and Open Cassette Dual light path array + area array imaging system, fast scanning UV based optical system can better capture subtle defects Support hardware, software, and fitting multiple automatic focusing modes to ensure the inspection accuracy of large warped wafers Support partition inspection with multiple ROIs and layers Support D2D, D2G, D2DB inspection algorithms Support AI defect inspection and classification Support data integration with customer MES systems