The Tornado 2000 is VPTek’s fully automated optical wafer inspection system designed for sub-micron precision. Its advanced dual-optical-path imaging system and multiple illumination options accommodate optical imaging challenges across a wide range of materials. Supporting D2D, D2G, C2C, D2DB, and AI inspection modes, it is suitable for large-die and non-array wafer defect inspection. The Tornado 2000’s flexible hardware and software configurations enable defect detection in both front-end and back-end processes. Key advantages include flexibility and ease of use, high efficiency, and low cost.
Application Scenarios
2D and 3D surface defect inspection for 4-, 6-, and 8-inch wafers across front-end, mid-end, back-end, and advanced packaging processes
Key Features
Compatible with 4, 6, and 8-inch wafers simultaneously, flexible and convenient
Dual Port cyclic loading and unloading reduces operator waiting time
Supports bright and dark field illumination to better capture subtle defects
Support multiple automatic focusing modes in hardware, software, and fitting to ensure the inspection accuracy of large warped wafers
Support partition inspection with multiple ROIs and layers
Support D2D、D2G and D2DB inspection algorithm
Support AI defect inspection and classification
Support data integration with customer MES systems