型號： Tornado2000
VPTek Tornado 2000
Wafer surface defect inspection設備
數量
Tornado 2000 是 VPTek 推出針對次微米級精度的晶圓全自動光學檢測設備，先進的雙光路光學影像系統及多種照明方案，適應各類不同材質的光學影像問題，支援D2D、D2G、C2C、D2DB、AI 等檢測模式，可適用大尺寸 DIE、非陣列式排布的晶圓缺陷，Tornado 2000 靈活的軟硬體配置，可適用於前段、後段製程的缺陷偵測。具備靈活易用、高效率、低成本等重大優勢。
Application Scenarios
針對4、6、8吋晶圓前段、中段、後段及先進封裝過程中的表面2D及3D缺陷檢測
Key Features
- Compatible with 4, 6, and 8-inch wafers simultaneously, flexible and convenient
- Dual Port cyclic loading and unloading reduces operator waiting time
- Supports bright and dark field illumination to better capture subtle defects
- Support multiple automatic focusing modes in hardware, software, and fitting to ensure the inspection accuracy of large warped wafers
- Support partition inspection with multiple ROIs and layers
- Support D2D、D2G and D2DB inspection algorithm
- Support AI defect inspection and classification
- Support data integration with customer MES systems
關閉