型號: Tornado2000

VPTek Tornado 2000

Wafer surface defect inspection設備

數量
Tornado 2000 是 VPTek 推出針對次微米級精度的晶圓全自動光學檢測設備,先進的雙光路光學影像系統及多種照明方案,適應各類不同材質的光學影像問題,支援D2D、D2G、C2C、D2DB、AI 等檢測模式,可適用大尺寸 DIE、非陣列式排布的晶圓缺陷,Tornado 2000 靈活的軟硬體配置,可適用於前段、後段製程的缺陷偵測。具備靈活易用、高效率、低成本等重大優勢。 

Application Scenarios

針對4、6、8吋晶圓前段、中段、後段及先進封裝過程中的表面2D及3D缺陷檢測

Key Features

    Compatible with 4, 6, and 8-inch wafers simultaneously, flexible and convenient
    Dual Port cyclic loading and unloading reduces operator waiting time
    Supports bright and dark field illumination to better capture subtle defects
    Support multiple automatic focusing modes in hardware, software, and fitting to
        ensure the inspection accuracy of large warped wafers
    Support partition inspection with multiple ROIs and layers
    Support D2D、D2G and D2DB inspection algorithm
    Support AI defect inspection and classification
    Support data integration with customer MES systems
 
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